ION-BEAM MODIFICATION OF GLASS-SURFACE PROPERTIES

This paper presents a general review of the effects, including H decoration of defects, induced by ion implantation of silicate and fluoride glasses. Ion implantation into glasses results in network damage and in compositional changes. Compositional changes are due to internal electric field formation, radiation enhanced diffusion processes and preferential sputtering, connected to different stopping power (electronic or nuclear) regimes of the incident particles. Such effects create modifications in the mechanical, optical and chemical properties of the glasses. © 1990.