MECHANISM AND KINETICS OF TETRACHLOROSILANE REACTIONS IN AN ARGON-HYDROGEN MICROWAVE PLASMA

被引：31

作者：

MAYO, N

CARMI, U

ROSENTHAL, I

AVNI, R

MANORY, R

GRILL, A

机构：

[1] NUCL RES CTR NEGEV,POB 9001,IL-84190 BEERSHEBA,ISRAEL

[2] BEN GURION UNIV NEGEV,DEPT MAT ENGN,IL-84107 BEER SHEVA,ISRAEL

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 12期

关键词：

D O I：

10.1063/1.333011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4404 / 4412

页数：9

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