EXPLOSIVE LIQUID-PHASE CRYSTALLIZATION OF THIN SILICON FILMS DURING PULSE HEATING

被引：19

作者：

ANDRA, G

GEILER, HD

GOTZ, G

HEINIG, KH

WOITTENNEK, H

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1982年 / 74卷 / 02期

关键词：

D O I：

10.1002/pssa.2210740217

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：511 / 515

页数：5

共 7 条

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[J]. APPLIED PHYSICS LETTERS, 1981, 39 (09) : 724 - 726
[2] BAGLEY BG, 1978, AIP C P LASER SOLID, P92
[3] GLAZOV VM, 1967, ZHIDKIE POLUPROVODNI
[4] TEMPERATURE DISTRIBUTIONS DURING CRYSTALLIZATION AT CONSTANT VELOCITY
HOPPER, RW
UHLMANN, DR
[J]. JOURNAL OF CRYSTAL GROWTH, 1973, 19 (03) : 177 - 186
[5] EXPLOSIVE CRYSTALLIZATION OF AMORPHOUS-GERMANIUM
LEAMY, HJ
BROWN, WL
CELLER, GK
FOTI, G
GILMER, GH
FAN, JCC
[J]. APPLIED PHYSICS LETTERS, 1981, 38 (03) : 137 - 139
[6] SIMULATION OF SPHERULITIC CRYSTALLIZATION IN THIN AMORPHOUS ANTIMONY FILMS
MULLER, H
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 66 (01): : 199 - 205
[7] WAGNER MR, UNPUB