OXIDATION OF VACUUM-EVAPORATED FILMS OF TIN AND STANNOUS OXIDE

被引：12

作者：

NAGASAKA, M ^{[1
]}

FUSE, H ^{[1
]}

YAMASHINA, T ^{[1
]}

机构：

[1] HOKKAIDO UNIV,FAC ENGN,DEPT NUCL ENGN,SAPPORO 060,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(75)90183-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L29 / L32

页数：4

相关论文

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[2] OXIDATION OF VACUUM DEPOSITED FILMS OF LEAD [J].

HAPASE, MG ;

GHARPUREY, MK ;

BISWAS, AB .

[3]

KUBASCHEWSKI O, 1962, OXIDATION METALS ALL, P259

[4] SORPTION KINETICS OF OXYGEN AT VERY LOW-PRESSURES BY ZIRCONIUM [J].

NAGASAKA, M ;

UYEDA, E ;

YAMASHINA, T .

[5]

POWELL CF, 1966, VAPOR DEPOSITION, P397

[6]

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