FRACTURE-TOUGHNESS OF CHEMICALLY VAPOR-DEPOSITED DIAMOND

被引：43

作者：

DRORY, MD ^{[1
]}

GARDINIER, CF ^{[1
]}

SPECK, JS ^{[1
]}

机构：

[1] UNIV CALIF SANTA BARBARA,COLL ENGN,DEPT MAT,SANTA BARBARA,CA 93106

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1991年 / 74卷 / 12期

关键词：

FRACTURE TOUGHNESS; DIAMONDS; CHEMICAL VAPOR DEPOSITION (CVD); FILMS; INDENTATION;

D O I：

10.1111/j.1151-2916.1991.tb04317.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The fracture toughness of chemically vapor-deposited diamond is estimated by a Vickers indentation method. Free-standing diamond films of 400-mu-m thickness are produced with plasma-enhanced chemical vapor deposition and highly polished for indentation testing. Indentation testing was performed with a microhardness tester using a load range of 5 to 8 N. The average fracture toughness is estimated as 5.3 +/- 1.3 MPA.m1/2.

引用

页码：3148 / 3150

页数：3

共 5 条

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[2] FRACTURE TOUGHNESS DETERMINATIONS BY INDENTATION
EVANS, AG
CHARLES, EA
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1976, 59 (7-8) : 371 - 372
[3] FIELD JE, 1986, I PHYS C SER, V75, P181
[4] JASSORWSKI DM, 1989, INVESTIGATION APPLIC
[5] OHERN ME, 1989, DETERMINATION MECHAN, P131

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