THIN YBA2CU3O7-DELTA FILMS BY ELECTRON-BEAM COEVAPORATION - GROWTH AND INSITU CHARACTERIZATION

被引：3

作者：

MAUL, M ^{[1
]}

SCHULTE, B ^{[1
]}

HAUSSLER, P ^{[1
]}

ADRIAN, H ^{[1
]}

机构：

[1] TH DARMSTADT,INST FESTKORPERPHYS,W-6100 DARMSTADT,GERMANY

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 04期

关键词：

D O I：

10.1063/1.353147

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report on the in situ preparation and characterization of thin YBaCuO7-delta films on various substrates. The films were grown by electron-beam coevaporation of the pure metals Y, Ba, and Cu. A pressure stage is used to obtain high partial O2 pressure close to the substrate and low pressure in the main vacuum system. In situ resistance measurements were performed to investigate growth dynamics during film formation, and temperature dependence during the cool down from T almost-equal-to 1000 K to T < T(c), The films were analyzed by R(T), ac susceptibility, x-ray diffraction, and critical transport current measurements.

引用

页码：2032 / 2034

页数：3

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