EFFECT OF FAST COOLING ON DIFFUSION-INDUCED IMPERFECTIONS IN SILICON

被引：19

作者：

JOSHI, ML

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1965年 / 112卷 / 09期

关键词：

D O I：

10.1149/1.2423730

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：912 / &

共 27 条

[1] ON ANALYSIS OF DISLOCATION NETWORKS [J].

BOLLMANN, W .

PHILOSOPHICAL MAGAZINE, 1962, 7 (81) :1513-&

[2] EVIDENCE OF DISLOCATION JOGS IN DEFORMED SILICON [J].

DASH, WC .

JOURNAL OF APPLIED PHYSICS, 1958, 29 (04) :705-709

[3] DISLOCATION ENERGIES IN ANISOTROPIC CRYSTALS [J].

FOREMAN, AJE .

ACTA METALLURGICA, 1955, 3 (04) :322-330

[4] ON THE PLASTICITY OF GERMANIUM AND INDIUM ANTIMONIDE [J].

HAASEN, P .

ACTA METALLURGICA, 1957, 5 (10) :598-599

[5] DEFECTS IN SPHALERITE STRUCTURE [J].

HOLT, DB .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1962, 23 (OCT) :1353-&

[6] DIRECT OBSERVATIONS OF GEOMETRY OF DEFECTS IN GERMANIUM [J].

HOLT, DB ;

DANGOR, AE .

PHILOSOPHICAL MAGAZINE, 1963, 8 (95) :1921-&

[7] DIFFUSION-INDUCED DISLOCATION NETWORKS IN SI ( P + B DIFFUSION E/T ) [J].

JACCODINE, RJ .

APPLIED PHYSICS LETTERS, 1964, 4 (06) :114-&

[8]

JENKINSON AE, 1961, DIRECT OBSERVATIONS, P471

[9] DIFFUSION-INDUCED IMPERFECTIONS IN SILICON [J].

JOSHI, ML ;

WILHELM, F .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (2P1) :185-&

[10] INFRARED ABSORPTION AND OXYGEN CONTENT IN SILICON AND GERMANIUM [J].

KAISER, W ;

KECK, PH ;

LANGE, CF .

PHYSICAL REVIEW, 1956, 101 (04) :1264-1268

← 1 2 3 →