ISOTHERMAL ANNEALING OF E'1 DEFECTS IN ION-IMPLANTED SIO2

被引:17
作者
DEVINE, RAB
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关键词
D O I
10.1016/0168-583X(84)90095-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
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页码:378 / 382
页数:5
相关论文
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