E-BEAM WRITING TECHNIQUES FOR SEMICONDUCTOR-DEVICE FABRICATION

[1] AMBOSS K, 1971, 11 P S EL ION LAS BE

[2] ANGELLO SJ, 1970, IEEE T ELECTRON DEVI, VED17, P442

[3] BEASLEY JP, 1970, 4 P INT C EL ION BEA

[4] BREWER GR, 1970, 4 P INT C EL ION BEA

[5] CAHEN O, 1972, 5 P INT C EL ION BEA

[6] CHANG THP, 1971, 11 P S EL ION LAS BE

[7] CHEN DR, 1972, INT ELECTRON DEVICES

[8] HATZAKIS M, 1969, 10 P S EL ION LAS BE

[9] MIYAUCHI S, 1970, IEEE T ELECTRON DEVI, VED17, P450

[10] PANKRATZ JM, DAAB0571C3715 CONTR

[1] AMBOSS K, 1971, 11 P S EL ION LAS BE

[2] ANGELLO SJ, 1970, IEEE T ELECTRON DEVI, VED17, P442

[3] BEASLEY JP, 1970, 4 P INT C EL ION BEA

[4] BREWER GR, 1970, 4 P INT C EL ION BEA

[5] CAHEN O, 1972, 5 P INT C EL ION BEA

[6] CHANG THP, 1971, 11 P S EL ION LAS BE

[7] CHEN DR, 1972, INT ELECTRON DEVICES

[8] HATZAKIS M, 1969, 10 P S EL ION LAS BE

[9] MIYAUCHI S, 1970, IEEE T ELECTRON DEVI, VED17, P450

[10] PANKRATZ JM, DAAB0571C3715 CONTR