CHEMISORPTION OF NO ON PT(410) SURFACE STUDIED BY AES, UPS AND XPS

被引：9

作者：

MIKI, H

TAKEUCHI, K

KIOKA, T

SUGAI, S

KAWASAKI, K

机构：

[1] Department of Physics Faculty of Science and Technology, Science University of Tokyo, Chiba

来源：

VACUUM | 1990年 / 41卷 / 1-3期

关键词：

D O I：

10.1016/0042-207X(90)90287-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The adsorption of nitric oxide on a Pt(410) surface has been studied by Auger electron spectroscopy (AES) and photoelectron spectroscopy (UPS and XPS). The results indicate that part of NO adsorbs dissociatively on the Pt(410) surface at room temperature. Molecular NO desorbs around 370 K. The presence of atomic oxygen and nitrogen is verified by AES, UPS and XPS. The UPS data show typical molecular NO and atomic O and N emission peaks at 2.5, 9.6 and 14.8 eV, and 5.0 eV below the Fermi level, respectively. The XPS data indicates a shift of 0.8 eV in the oxygen 1s level towards lower binding energy. The oxygen atom diffuses into the bulk above 450 K and diffuses back to the surface and desorbs above 800 K. © 1990 Pergamon Press plc.

引用

页码：105 / 108

页数：4

共 24 条

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