ION AND PLASMA BEAM ASSISTED THIN-FILM DEPOSITION

被引：17

作者：

OECHSNER, H

机构：

来源：

THIN SOLID FILMS | 1989年 / 175卷

关键词：

D O I：

10.1016/0040-6090(89)90818-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：119 / 127

页数：9

共 26 条

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AVERBACK, RS .

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[6] PROPERTY MODIFICATION AND SYNTHESIS BY LOW-ENERGY PARTICLE BOMBARDMENT CONCURRENT WITH FILM GROWTH [J].

CUOMO, JJ ;

ROSSNAGEL, SM .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :963-974

[7] ION-BEAM ASSISTED DEPOSITION OF SUBSTOICHIOMETRIC SILICON-NITRIDE [J].

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BRIGHTON, DR ;

HUBLER, GK ;

VANVECHTEN, D .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :983-986

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THIN SOLID FILMS, 1980, 65 (02) :233-245

[9] BACKSCATTERING OF NEUTRALIZED NOBLE-GAS IONS FROM POLYCRYSTALLINE SURFACES AT BOMBARDING ENERGIES BELOW 1KEV [J].

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[10]

Harper J. M. E., 1978, THIN FILM PROCESSES, P175

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