MICROSTRUCTURES OF PT/CO FILMS DEPOSITED ON SPUTTER-ETCHED UNDERLAYERS

被引：5

作者：

SUMI, S ^{[1
]}

TANASE, K ^{[1
]}

TERAGAKI, Y ^{[1
]}

TORAZAWA, K ^{[1
]}

TSUNASHIMA, S ^{[1
]}

UCHIYAMA, S ^{[1
]}

机构：

[1] NAGOYA UNIV,DEPT ELECT ENGN,NAGOYA 46401,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 10期

关键词：

PT; CO; SIN; MULTILAYER; SPUTTERING; ETCHING; UNDERLAYER; MAGNETIC ANISOTROPY; SURFACE;

D O I：

10.1143/JJAP.31.3328

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Pt/Co multilayered films deposited on a sputter-etched SiN underlayer show larger magnetic anisotropy (1 x 10(6) erg/cm3) and better squareness(=1) than those on nonetched underlayers. The results of small-angle X-ray diffraction indicate the improvement of the multilayer structural order due to the etching. According to the transmission electron microscopy observation and the electrical resistivity measurement, the etching of underlayers transforms the Pt/Co films from island structure to continuous structure in an early stage of film growth. The scanning tunneling microscopy observation suggests that the sputter etching flattens the surface of the underlayer.

引用

页码：3328 / 3331

页数：4

共 8 条

[1]

Carcia P., 1991, J MAGN SOC JPN S1, V15, P151, DOI 10.3379/jmsjmag.15.S1_151

[2] DIELECTRIC ENHANCEMENT LAYERS FOR A PT/CO MULTILAYER MAGNETOOPTICAL RECORDING MEDIUM [J].