RAMAN-SCATTERING SPECTROSCOPY APPLIED TO STUDY OF CHEMICAL VAPOR-DEPOSITION SYSTEMS

被引：30

作者：

SEDGWICK, TO ^{[1
]}

SMITH, JE ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 02期

关键词：

D O I：

10.1149/1.2132798

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：254 / 258

页数：5

共 19 条

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[5]

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