MEASUREMENT OF HALL SCATTERING FACTOR IN PHOSPHORUS-DOPED SILICON

被引：21

作者：

DELALAMO, JA

SWANSON, RM

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 06期

关键词：

D O I：

10.1063/1.334333

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2314 / 2317

页数：4

共 30 条

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