VARIABLE COMPOSITION THIN-FILMS IN TERNARY CHALCOGENIDE SYSTEMS BY RF COSPUTTERING

被引:11
作者
BOLKER, BFT
SIDLES, PH
DANIELSON, GC
机构
[1] IOWA STATE UNIV,DEPT PHYS,AMES,IA 50010
[2] US ATOM ENERGY COMM,AMES LAB,AMES,IA 50010
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期
关键词
D O I
10.1116/1.568736
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:114 / 116
页数:3
相关论文
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