SODIUM-FLUORIDE THIN-FILMS BY CHEMICAL VAPOR-DEPOSITION

被引：26

作者：

LINGG, LJ ^{[1
]}

BERRY, AD ^{[1
]}

PURDY, AP ^{[1
]}

EWING, KJ ^{[1
]}

机构：

[1] VIRGINIA TECH,FIBER & ELECTRO OPT RES CTR,BLACKSBURG,VA

来源：

THIN SOLID FILMS | 1992年 / 209卷 / 01期

关键词：

D O I：

10.1016/0040-6090(92)90003-T

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of sodium fluoride have been deposited for the first time by chemical vapor deposition of the fluorinated metal organic precursors sodium hexafluoroisopropoxide, sodium perfluoro-t-butoxide, sodium hexafluoroacetylacetonate and sodium heptafluoro-octadionate. The best quality films were obtained using sodium hexafluoroisopropoxide in vacuo at a substrate temperature of 250-300-degrees-C.

引用

页码：9 / 16

页数：8

共 21 条

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