FORCE PROBE CHARACTERIZATION USING SILICON 3-DIMENSIONAL STRUCTURES FORMED BY FOCUSED ION-BEAM LITHOGRAPHY

被引：12

作者：

EDENFELD, KM

JARAUSCH, KF

STARK, TJ

GRIFFIS, DP

RUSSELL, PE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587473

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3571 / 3575

页数：5

共 19 条

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