THE ROLE OF SURFACE FLAWS IN COMPETITIVE PHOTOANODIC PROCESSES AT TIO2 ELECTRODES

被引：25

作者：

KOBAYASHI, T

YONEYAMA, H

TAMURA, H

机构：

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1982年 / 138卷 / 01期

关键词：

D O I：

10.1016/0022-0728(82)87132-5

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：105 / 119

页数：15

共 39 条

[1] Thermodynamic Potential for the Anodic Dissolution of n-Type Semiconductors [J].

Bard, Allen J. ;

Wrighton, Mark S. .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) :1706-1710

[2]

BODDY PJ, 1968, J ELECTROCHEM SOC, V115, P119

[3] SURFACE-TREATMENT INDUCED SUB-BAND GAP PHOTORESPONSE OF GAP PHOTOELECTRODES [J].

BUTLER, MA ;

GINLEY, DS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) :712-714

[4] NOVEL SURFACE PREPARATION FOR SINGLE-CRYSTAL TIO2 AND ITS CHARACTERIZATION BY PHOTOCURRENT-VOLTAGE MEASUREMENTS [J].

DAREEDWARDS, MP ;

HAMNETT, A .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1979, 105 (02) :283-290

[5] SEMICONDUCTOR ELECTRODES .12. PHOTOASSISTED OXIDATIONS AND PHOTOELECTROSYNTHESIS AT POLYCRYSTALLINE TIO2 ELECTRODES [J].

FRANK, SN ;

BARD, AJ .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1977, 99 (14) :4667-4675

[6]

FRANK SN, 1975, J AM CHEM SOC, V97, P7424

[7] INVESTIGATION OF PHOTOELECTROCHEMICAL CORROSION OF SEMICONDUCTORS .1. [J].

FRESE, KW ;

MADOU, MJ ;

MORRISON, SR .

JOURNAL OF PHYSICAL CHEMISTRY, 1980, 84 (24) :3172-3178

[8] COMPETITIVE PHOTOELECTROCHEMICAL OXIDATION OF REDUCING AGENTS AT THE TIO2 PHOTOANODE [J].

FUJISHIMA, A ;

INOUE, T ;

HONDA, K .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1979, 101 (19) :5582-5588

[9]

GERISCHER H, 1973, BER BUNSEN PHYS CHEM, V77, P284

[10] STABILITY OF SEMICONDUCTOR ELECTRODES AGAINST PHOTODECOMPOSITION [J].

GERISCHER, H .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1977, 82 (1-2) :133-143

← 1 2 3 4 →