HIGH-FIELD MAGNETIZATION OF HALDANE MATERIALS TMNIN AND NINAZ

被引：11

作者：

TAKEUCHI, T

HORI, H

DATE, M

YOSIDA, T

KATSUMATA, K

RENARD, JP

GADET, V

VERDAGUER, M

机构：

[1] OSAKA UNIV,CTR LOW TEMP,TOYONAKA,OSAKA 560,JAPAN

[2] INST PHYS & CHEM RES,WAKO,SAITAMA 35101,JAPAN

[3] UNIV PARIS 11,INST ELECTR FONDAMENTALE,CNRS,URA 22,F-91405 ORSAY,FRANCE

[4] UNIV PARIS 06,CHIM MET TRANSIT LAB,F-75252 PARIS 05,FRANCE

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1992年 / 104卷

关键词：

D O I：

10.1016/0304-8853(92)90372-U

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A magnetization measurement has been performed on the Haldane gap materials (CH3)4NNi(NO2)3 (TMNIN) and Ni(C3H10N2)2N3ClO4 (NINAZ) in pulsed high magnetic fields. TMNIN shows the typical magnetization profile of a Haldane gap material with a gap of 3.4 K. Quenching of the gap appears around 2.5 T and magnetic saturation is obtained above 30 T. In NINAZ, however, the quenching appears around 30 T reflecting a large Haldane gap energy with a magnitude of 40 K.

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页码：813 / 814

页数：2

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