HIGH-TEMPERATURE SCANNING TUNNELING MICROSCOPY STUDY OF THE PHASE-TRANSITION OF 16-STRUCTURE APPEARING ON A SI(110) SURFACE

被引:14
作者
YAMAMOTO, Y
SUEYOSHI, T
SATO, T
IWATSUKI, M
机构
[1] JEOL Ltd., Akishima, Tokyo, 196
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1993年 / 32卷 / 4A期
关键词
SI(110); STM; HIGH TEMPERATURE; SURFACE STRUCTURE; PHASE TRANSITION;
D O I
10.1143/JJAP.32.L532
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-temperature scanning tunneling microscopy (HTSTM) has been developed which enables distortionless observation of the dynamic behavior of surface atoms at high temperatures up to 900-degrees-C on an atomic scale, and it was applied to analyze the mechanism of reversible phase transition between the 16-structure and the 1x1 structure appearing on a clean Si(110) surface. It has been found that, at first, the reconstruction and destruction of the 16-structure begin on the unit-cell level along the [112] direction and then progress along the [111] direction as a whole in order to complete the phase transition. The direct observation of the reconstruction at high temperatures is very important to investigate the mechanism of crystal growth.
引用
收藏
页码:L532 / L535
页数:4
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