HIGH-ENERGY X-RAY RESPONSE OF PHOTOGRAPHIC FILMS - MODELS AND MEASUREMENT

被引：171

作者：

HENKE, BL

UEJIO, JY

STONE, GF

DITTMORE, CH

FUJIWARA, FG

机构：

[1] UNIV CALIF LAWRENCE LIVERMORE NATL LAB,LIVERMORE,CA 94550

[2] UNIV HAWAII,HONOLULU,HI 96822

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 1986年 / 3卷 / 11期

关键词：

D O I：

10.1364/JOSAB.3.001540

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1540 / 1550

页数：11

共 8 条

[1]

Henke B. L., 1982, Atomic Data and Nuclear Data Tables, V27, P1, DOI 10.1016/0092-640X(82)90002-X

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[3] LOW-ENERGY X-RAY RESPONSE OF PHOTOGRAPHIC FILMS .2. EXPERIMENTAL CHARACTERIZATION [J].

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[5] PULSED PLASMA SOURCE SPECTROMETRY IN THE 80-8000-EV X-RAY REGION [J].

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[6]

KOPPEL LN, 1981, FR81112 ADV RES APPL

[7] 2 NEW X-RAY-FILMS - CONDITIONS FOR OPTIMUM DEVELOPMENT AND CALIBRATION OF RESPONSE [J].

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JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1985, 18 (FEB) :3-7

[8] X-RAY-CALIBRATION OF KODAK DIRECT EXPOSURE FILM [J].

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APPLIED OPTICS, 1985, 24 (16) :2536-2542

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