INFLUENCE OF DUV EXCIMER LASER-RADIATION (LAMBDA=193 NM) ON CMOS DEVICES

被引：3

作者：

EDEN, K ^{[1
]}

BENEKING, H ^{[1
]}

ROTH, W ^{[1
]}

机构：

[1] EL MOS GMBH, D-4600 DORTMUND, FED REP GER

来源：

APPLIED SURFACE SCIENCE | 1989年 / 36卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90938-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：421 / 431

页数：11

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