DIRECT EVIDENCE FOR BETA-HYDRIDE ELIMINATION ON SI(100)

被引：34

作者：

KEELING, LA

CHEN, L

GREENLIEF, CM

MAHAJAN, A

BONSER, D

机构：

[1] UNIV MISSOURI,DEPT CHEM,COLUMBIA,MO 65211

[2] UNIV TEXAS,SCI & TECHNOL CTR SYNTH GROWTH & ANAL ELECTR MAT,AUSTIN,TX 78712

来源：

CHEMICAL PHYSICS LETTERS | 1994年 / 217卷 / 1-2期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0009-2614(93)E1355-K

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The adsorption and decomposition of ethylbromide on Si(100)-(2X1) is investigated as a way of generating surface ethyl groups. The interactions of ethylbromide with Si are explored by a variety of methods including ultraviolet photoelectron spectroscopy, temperature-programmed desorption and high-resolution electron energy loss spectroscopy. Ethylbromide adsorbs molecularly on Si(100) at a surface temperature of 110 K. The C-Br bond cleaves by warming the surface to temperatures greater than 200 K. The resulting ethyl groups decompose at surface temperatures greater than 500 K to yield ethylene and molecular hydrogen. Deuterium labelling of the ethyl group is used to verify that the predominant pathway to ethylene production is through a beta-hydride elimination step.

引用

页码：136 / 141

页数：6

共 35 条

[1] SURFACE ORGANOMETALLIC CHEMISTRY IN THE CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS USING TRIISOBUTYLALUMINUM - BETA-HYDRIDE AND BETA-ALKYL ELIMINATION-REACTIONS OF SURFACE ALKYL INTERMEDIATES [J].