DEPOSITION OF MOLYBDENUM CHALCOGENIDE THIN-FILMS BY THE CHEMICAL-DEPOSITION TECHNIQUE AND THE EFFECT OF BATH PARAMETERS ON THESE THIN-FILMS

A modified method has been developed for the chemical deposition of thin films of MoS2 and MoSe2 on glass substrate at 363 K. For MoS2 and MoSe2 deposition instead of hydrazine hydrate sodium dithionite was used as a reducing agent. Variation of thickness with different bath parameters have been studied to obtain thickest possible deposition. X-ray characterization, optical absorption have been performed to confirm the deposition of MoS2 and MoSe2. © 1990.