KINETICS OF ELECTRODEPOSITION AND CATALYTIC ACTIVITY OF THIN FILMS OF RUTHENIUM

被引：39

作者：

FLEISCHMANN, M

KORYTA, J

THIRSK, HR

机构：

来源：

TRANSACTIONS OF THE FARADAY SOCIETY | 1967年 / 63卷 / 533P期

关键词：

D O I：

10.1039/tf9676301261

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1261 / +

页数：1

共 11 条

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[2] ANODIC BEHAVIOUR OF MERCURY IN HYDROXIDE ION SOLUTIONS
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[3] KINETICS OF ELECTROCRYSTALLIZATION OF THIN FILMS OF CALOMEL
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[4] ZWEIDIMENSIONALE KEIMBILDUNG UND AUSBREITUNG VON MONOATOMAREN SCHICHTEN AN VERSETZUNGSFREIEN (100)-FLACHEN VON SILBEREINKRISTALLEN
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[6] ELECTROCRYSTALLIZATION OF THIN FILMS OF THALLOUS CHLORIDE ON THALLIUM AMALGAM
FLEISCHMANN, M
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THIRSK, HR
[J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1965, 61 (510P): : 1256 - +
[7] KINETICS OF ELECTROCRYSTALLIZATION OF THIN FILMS OF CADMIUM HYDROXIDE
FLEISCHMANN, M
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THIRSK, HR
[J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1963, 59 (483): : 741 - &
[8] ELECTROCRYSTALLIZATION OF THIN FILMS OF NICKEL
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[9] FLEISCHMANN M, 1964, ELECTROCHIM ACTA, V9, P757
[10] Slendyk I, 1932, Z PHYS CHEM A-CHEM T, V162, P223