SENSITIVITY-ENHANCED ELECTRON-HOLOGRAPHIC INTERFEROMETRY AND THICKNESS-MEASUREMENT APPLICATIONS AT ATOMIC SCALE

被引：75

作者：

TONOMURA, A

MATSUDA, T

KAWASAKI, T

ENDO, J

OSAKABE, N

机构：

来源：

PHYSICAL REVIEW LETTERS | 1985年 / 54卷 / 01期

关键词：

D O I：

10.1103/PhysRevLett.54.60

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：60 / 62

页数：3

共 15 条

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[9]

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[10] OBSERVATION OF RECORDED MAGNETIZATION PATTERN BY ELECTRON HOLOGRAPHY [J].

OSAKABE, N ;

YOSHIDA, K ;

HORIUCHI, Y ;

MATSUDA, T ;

TANABE, H ;

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TONOMURA, A .

APPLIED PHYSICS LETTERS, 1983, 42 (08) :746-748

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