MONOSILANE ADSORPTION ON POROUS ALUMINA

被引:3
作者
IMAI, H
WATANABE, T
SUZUKI, T
机构
[1] NIPPIN SANSO CO LTD,YAMANASHI LAB,TAKANE,YAMANASHI 408,JAPAN
[2] YAMANASHI UNIV,DEPT APPL CHEM & BIOTECHNOL,KOFU,YAMANASHI 400,JAPAN
关键词
D O I
10.1149/1.2048713
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Adsorption of monosilane on porous adsorbents consisting of gamma-alumina, alumina-silica, and silica was investigated. The maximum adsorption capacity was observed for alumina adsorbents with drying in nitrogen at similar to 100 degrees C. Thus, monosilane is deduced to react with hydroxyl groups on gamma-alumina surface, although physically adsorbed water interferes with the reaction. On the other hand, hydroxyl groups on silica were inactive for monosilane. The difference in the reactivity of hydroxyl groups with monosilane is ascribed to the basicity of the oxides.
引用
收藏
页码:3202 / 3204
页数:3
相关论文
共 6 条
[1]  
CAMBRIA TD, 1989, SOLID STATE TECHNOL, V32, pS1
[2]  
Cotton M. L., 1977, CAN METALL Q, V16, P205
[3]  
DEAN JA, 1985, LANGES HDB CHEM
[4]  
HAAKLE G, 1988, J ELECTROCHEM SOC, V135, P715
[5]  
HARDWICK SJ, 1988, SOLID STATE TECHNOL, V31, P93
[6]   THE ELIMINATION OF H2O AND SIH4 IN ASH3 [J].
IKEDA, T ;
NODA, H ;
MATSUMOTO, K .
JOURNAL OF CRYSTAL GROWTH, 1992, 124 (1-4) :272-277