DEPENDENCE OF ELECTRON-CYCLOTRON RESONANCE PLASMA CHARACTERISTICS ON MAGNETIC-FIELD PROFILES

被引：15

作者：

SAMUKAWA, S ^{[1
]}

NAKAMURA, T ^{[1
]}

机构：

[1] NEC CORP LTD,MECHATRON RES LAB,MIYAMAE KU,KAWASAKI,KANAGAWA 213,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11B期

关键词：

ECR PLASMA ETCHING; ECR POSITION; MAGNETIC FIELD PROFILE; MAGNETIC FIELD GRADIENT; ION ENERGY;

D O I：

10.1143/JJAP.30.3147

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron cyclotron resonance (ECR) plasma generation is influenced by the magnetic field profiles in ECR plasma. When an 875 G equimagnetic field and magnetic field gradient are nonuniform, the nonuniform plasma is generated around the ECR position (875 G position). Uneven plasma discharge causes ion acceleration and disturbs the ion flight directions due to the potential differences in ECR plasma. Therefore, a uniform magnetic field gradient at the ECR position and the flat 875 G equimagnetic field profile are necessary to achieve a precise pattern transfer without microloading effects.

引用

页码：3147 / 3153

页数：7

共 7 条

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