REPAIR OF OPAQUE DEFECTS ON REFLECTION MASKS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：6

作者：

HAWRYLUK, AM ^{[1
]}

STEWART, D ^{[1
]}

机构：

[1] MICRION CORP,PEABODY,MA 01960

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.585908

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a new technique for removing opaque defects on soft x-ray projection lithography reflection masks using ion beam etching. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a thin, Si overcoat to protect the multilayers from the kinetic energy of the ion beam, reduced ion beam energy, and a Ar ion beam to avoid absorption losses. A Si ion beam could also be used in this process.

引用

页码：3182 / 3185

页数：4