THE 540-900 NM PHOTODISSOCIATION OF 300-K NCNO - ONE-PHOTON AND 2-PHOTON PROCESSES

被引：42

作者：

NADLER, I

PFAB, J

REISLER, H

WITTIG, C

机构：

来源：

JOURNAL OF CHEMICAL PHYSICS | 1984年 / 81卷 / 02期

关键词：

D O I：

10.1063/1.447746

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：653 / 660

页数：8

共 24 条

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