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TUNNELING TIME OF AN ELECTRON
被引:54
作者
:
THORNBER, KK
论文数:
0
引用数:
0
h-index:
0
THORNBER, KK
MCGILL, TC
论文数:
0
引用数:
0
h-index:
0
MCGILL, TC
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1967年
/ 38卷
/ 05期
关键词
:
D O I
:
10.1063/1.1709888
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:2384 / &
相关论文
共 13 条
[11]
BARRIER LOWERING AND FIELD PENETRATION AT METAL-DIELECTRIC INTERFACES - (AL-SI02 - MOS STRUCTURES - E)
[J].
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
;
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
.
APPLIED PHYSICS LETTERS,
1966,
9
(01)
:53
-&
[12]
VOLT-CURRENT CHARACTERISTICS FOR TUNNELING THROUGH INSULATING FILMS
[J].
STRATTON, R
论文数:
0
引用数:
0
h-index:
0
STRATTON, R
.
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1962,
23
(SEP)
:1177
-&
[13]
SZE GM, 1964, J APPL PHYS, V35, P2534
←
1
2
→
共 13 条
[11]
BARRIER LOWERING AND FIELD PENETRATION AT METAL-DIELECTRIC INTERFACES - (AL-SI02 - MOS STRUCTURES - E)
[J].
MEAD, CA
论文数:
0
引用数:
0
h-index:
0
MEAD, CA
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
;
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
.
APPLIED PHYSICS LETTERS,
1966,
9
(01)
:53
-&
[12]
VOLT-CURRENT CHARACTERISTICS FOR TUNNELING THROUGH INSULATING FILMS
[J].
STRATTON, R
论文数:
0
引用数:
0
h-index:
0
STRATTON, R
.
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1962,
23
(SEP)
:1177
-&
[13]
SZE GM, 1964, J APPL PHYS, V35, P2534
←
1
2
→