STRUCTURAL CHARACTERIZATION OF CO IN SPUTTERED TA/CO/TA THIN-FILM SANDWICHES

被引：7

作者：

BENAISSA, M

HUMBERT, P

LEFAKIS, H

WERCKMANN, J

SPERIOSU, VS

GURNEY, BA

机构：

[1] IPCMS, CNRS, UMR 46, SURFACES INTERFACES GRP, F-67037 STRASBOURG, FRANCE

[2] IBM CORP, ALMADEN RES CTR, DIV RES, SAN JOSE, CA 95120 USA

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 148卷 / 1-2期

关键词：

D O I：

10.1016/0304-8853(95)00129-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The morphology and structure of sputtered Ta/Co/Ta thin-film sandwiches were investigated by cross-sectional high-resolution transmission electron microscopy. Although the Co layer shows an overall [111]-oriented fee structure, a high density of hcp stacking faults is present in the layer. The Co structure can thus be described as a random distribution of hcp stacking sequences in an overall fee structure.

引用

页码：15 / 16

页数：2