OZONE CLEANING OF THE SI-SIO2 SYSTEM

[1] BECK A, 1984, THESIS FEDERAL ARMED

[2] ELLIOT DJ, 1981, INTEGRATED CIRCUIT F

[3] FUENZALIDA V, 1985, THESIS FEDERAL ARMED

[4] GNANN M, 1986, THESIS TU MUNICH

[5] KASSABOV J, IN PRESS

[6] NICOLLIAN EH, 1969, MOS PHYSICS TECHNOLO, P176

[7] UV OZONE CLEANING OF SILICON SUBSTRATES IN SILICON MOLECULAR-BEAM EPITAXY [J]. APPLIED PHYSICS LETTERS, 1984, 45 (10) : 1073 - 1075

[8] TASUMI T, 1985, JPN J APPL PHYS, V24, pL227

[9] ZAFONTE L, 1984, P SOC PHOTO-OPT INST, V470, P164, DOI 10.1117/12.941910

[1] BECK A, 1984, THESIS FEDERAL ARMED

[2] ELLIOT DJ, 1981, INTEGRATED CIRCUIT F

[3] FUENZALIDA V, 1985, THESIS FEDERAL ARMED

[4] GNANN M, 1986, THESIS TU MUNICH

[5] KASSABOV J, IN PRESS

[6] NICOLLIAN EH, 1969, MOS PHYSICS TECHNOLO, P176

[7] UV OZONE CLEANING OF SILICON SUBSTRATES IN SILICON MOLECULAR-BEAM EPITAXY [J]. APPLIED PHYSICS LETTERS, 1984, 45 (10) : 1073 - 1075

[8] TASUMI T, 1985, JPN J APPL PHYS, V24, pL227

[9] ZAFONTE L, 1984, P SOC PHOTO-OPT INST, V470, P164, DOI 10.1117/12.941910