TA/SIN-STRUCTURE X-RAY MASKS FOR SUB-HALF-MICRON LSIS

被引：21

作者：

OHKI, S

KAKUCHI, M

MATSUDA, T

OZAWA, A

OHKUBO, T

ODA, M

YOSHIHARA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.2074

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2074 / 2079

页数：6

共 15 条

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[8]

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[9]

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[10]

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