HYDROGEN IN LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED SILICON (OXY)NITRIDE FILMS

被引：70

作者：

HABRAKEN, FHPM ^{[1
]}

TIJHAAR, RHG ^{[1
]}

VANDERWEG, WF ^{[1
]}

KUIPER, AET ^{[1
]}

WILLEMSEN, MFC ^{[1
]}

机构：

[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 02期

关键词：

D O I：

10.1063/1.336651

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

SEMICONDUCTING SILICON

引用

页码：447 / 453

页数：7

共 30 条

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