HYDROGEN DISSOCIATION ON HOT TANTALUM AND TUNGSTEN FILAMENTS UNDER DIAMOND DEPOSITION CONDITIONS

被引:31
作者
OTSUKA, T
IHARA, M
KOMIYAMA, H
机构
[1] Department of Chemical System Engineering, Faculty of Engineering, University of Tokyo, Bunkyo-ku
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.359015
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electric power consumed by hot tantalum and tungsten filaments used to dissociate hydrogen molecules into hydrogen radicals was measured at filament temperatures of 2000, 2300, and 2500°C and hydrogen pressures from 0.5-100 Torr. The measured power consumption at pressures above 30 Torr was well represented by a model that assumed thermodynamic equilibrium between H 2 and H near the filament. With decreasing pressure, however, the dissociation of H2 shifted from an equilibrium-controlled regime to a surface-reaction-rate controlled regime. The relationship between the power consumption and the pressure in the surface-reaction-rate controlled regime was correlated with the surface dissociation probability, which was determined to range from 0.18 to 0.94. © 1995 American Institute of Physics.
引用
收藏
页码:893 / 898
页数:6
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