LASER MICROCHEMISTRY AND ITS APPLICATION TO ELECTRON-DEVICE FABRICATION

被引：126

作者：

OSGOOD, RM ^{[1
]}

机构：

[1] COLUMBIA UNIV, DEPT APPL PHYS, COLUMBIA RADIAT LAB, NEW YORK, NY 10027 USA

来源：

ANNUAL REVIEW OF PHYSICAL CHEMISTRY | 1983年 / 34卷

关键词：

D O I：

10.1146/annurev.pc.34.100183.000453

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

LASERS

引用

页码：77 / 101

页数：25

共 74 条

[31]

EHRLICH DJ, 1981, J ELECTROCHEM SOC, V128, P2039, DOI 10.1149/1.2127793

[32] PHOTODEPOSITION OF METAL-FILMS WITH ULTRAVIOLET-LASER LIGHT [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (01) :23-32

[33] UV PHOTOLYSIS OF VANDERWAALS MOLECULAR FILMS [J].

EHRLICH, DJ ;

OSGOOD, RM .

CHEMICAL PHYSICS LETTERS, 1981, 79 (02) :381-388

[34]

EHRLICH DJ, 1981, APPL PHYS LETT, V39, P957, DOI 10.1063/1.92624

[35] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) :1233-1243

[36] ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITION [J].

EHRLICH, DJ ;

OSGOOD, RM ;

SILVERSMITH, DJ ;

DEUTSCH, TF .

ELECTRON DEVICE LETTERS, 1980, 1 (06) :101-103

[37] LASER CHEMICAL TECHNIQUE FOR RAPID DIRECT WRITING OF SURFACE RELIEF IN SILICON [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

APPLIED PHYSICS LETTERS, 1981, 38 (12) :1018-1020

[38] SPATIALLY DELINEATED GROWTH OF METAL-FILMS VIA PHOTOCHEMICAL PRE-NUCLEATION [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

APPLIED PHYSICS LETTERS, 1981, 38 (11) :946-948

[39] LASER PHOTOCHEMICAL MICROALLOYING FOR ETCHING OF ALUMINUM THIN-FILMS [J].

EHRLICH, DJ ;

OSGOOD, RM ;

DEUTSCH, TF .

APPLIED PHYSICS LETTERS, 1981, 38 (06) :399-401

[40] SPECTROSCOPIC PROPERTIES OF MOLECULES INTERACTING WITH SMALL DIELECTRIC PARTICLES [J].

GERSTEN, J ;

NITZAN, A .

JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (03) :1139-1152

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