ALUMINUM THIN-FILM GROWTH ON A RU(0001) SURFACE

被引：7

作者：

CEBALLOS, G ^{[1
]}

THEIS, M ^{[1
]}

PELZER, T ^{[1
]}

SCHICK, M ^{[1
]}

RANGELOV, G ^{[1
]}

WANDELT, K ^{[1
]}

机构：

[1] UNIV MUNICH, SEKT PHYS, D-80799 MUNICH, GERMANY

来源：

SURFACE SCIENCE | 1995年 / 331卷

关键词：

ALUMINUM; AUGER ELECTRON SPECTROSCOPY; EPITAXY; LOW ENERGY ELECTRON DIFFRACTION (LEED); LOW INDEX SINGLE CRYSTAL SURFACES; RUTHENIUM; THERMAL DESORPTION SPECTROSCOPY; VISIBLE AND ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

D O I：

10.1016/0039-6028(95)00151-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The growth of thin Al films on a Ru(0001) substrate has been investigated by means of AES, LEED, TDS, and PAX measurements. A plot of the Ru and Al AES intensities versus evaporation time for a deposition temperature of 300 K reveals a distinct break at theta(Al) = 1, while for higher coverages the Ru intensity decays exponentially indicating a three-dimensional growth of Al clusters. From this behavior we deduce a Stranski-Krastanov growth mechanism. This behavior persists up to 650 K. For higher deposition temperatures a diffusion of Al into the substrate and a partial desorption of the Al film is found. At low Al coverage the LEED pattern reveals an initial film growth with Al(111) structure and an expansion of the interatomic spacing of 2% compared to the Al(111) bulk plane. This superstructure persisted up to similar to 2.5 ML. In the submonolayer regime CO and Xe TD-spectra as well as Xe4d PAX-spectra suggest together with LEED an island growth.

引用

页码：952 / 956

页数：5

共 15 条

[1] PHASE-EQUILIBRIA FOR THE ALUMINUM-RICH REGION OF THE AL-RU SYSTEM [J].