PULSED LASER OXIDATION AND NITRIDATION OF METAL-SURFACES IMMERSED IN LIQUID-MEDIA

被引:37
作者
OGALE, SB
POLMAN, A
QUENTIN, FOP
ROORDA, S
SARIS, FW
机构
关键词
D O I
10.1063/1.98248
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:138 / 140
页数:3
相关论文
共 13 条
[1]   LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION [J].
ALLEN, SD .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6501-6505
[2]  
[Anonymous], 1982, LASER ANNEALING SEMI
[3]  
Chu W. K., 1978, BACKSCATTERING SPECT
[5]   SILICON SOLAR-CELLS REALIZED BY LASER-INDUCED DIFFUSION OF VACUUM-DEPOSITED DOPANTS [J].
FOGARASSY, E ;
STUCK, R ;
GROB, JJ ;
SIFFERT, P .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (02) :1076-1082
[6]  
HOULE FA, 1984, P SOC PHOTO-OPT INST, V459, P110, DOI 10.1117/12.939444
[7]  
MAYO MJ, 1986, SOLID STATE TECHNOL, V29, P141
[8]   GROWTH OF AMORPHOUS TI2OO LAYERS BY LASER-INDUCED OXIDATION [J].
MERLIN, R ;
PERRY, TA .
APPLIED PHYSICS LETTERS, 1984, 45 (08) :852-853
[9]   P-N-JUNCTION FORMATION IN BORON-DEPOSITED SILICON BY LASER-INDUCED DIFFUSION [J].
NARAYAN, J ;
YOUNG, RT ;
WOOD, RF ;
CHRISTIE, WH .
APPLIED PHYSICS LETTERS, 1978, 33 (04) :338-340
[10]  
OGALE SB, UNPUB