EPITAXIAL METALLIC LANIO3 THIN-FILMS GROWN BY PULSED LASER DEPOSITION

被引：145

作者：

SATYALAKSHMI, KM

MALLYA, RM

RAMANATHAN, KV

WU, XD

BRAINARD, B

GAUTIER, DC

VASANTHACHARYA, NY

HEGDE, MS

机构：

[1] INDIAN INST SCI,SOLID STATE & STRUCT CHEM UNIT,BANGALORE 560012,KARNATAKA,INDIA

[2] INDIAN INST SCI,DEPT MET,BANGALORE 560012,KARNATAKA,INDIA

[3] INDIAN INST SCI,MAT RES CTR,BANGALORE 560012,KARNATAKA,INDIA

[4] LOS ALAMOS NATL LAB,CTR SUPERCOND TECHNOL,LOS ALAMOS,NM 87545

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 11期

关键词：

D O I：

10.1063/1.109612

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Epitaxial LaNiO3(LNO) thin films on LaAlO3(LAO), SrTiO3(STO), and YSZ are grown by pulsed laser deposition method at 350 mTorr oxygen partial pressure and 700-degrees-C substrate temperature. As-deposited LNO films are metallic down to 10 K. c-axis oriented YBa2Cu3O7 (YBCO) films were grown on LNO/LAO as well as LNO/STO surfaces without affecting superconducting transition temperature of YBCO. Textured LNO thin films were grown on c-axis oriented YBCO/STO and YBCO/YSZ. Transport measurements of these bilayer films showed that LNO is a good metallic contact material for YBCO.

引用

页码：1233 / 1235

页数：3

共 8 条

[1] CRYSTAL-STRUCTURE OF THE YBA2CU3O7 SUPERCONDUCTOR BY SINGLE-CRYSTAL X-RAY-DIFFRACTION [J].