MAGNETORESISTANCE IN CO-CU ALLOY-FILMS FORMED BY ELECTRODEPOSITION METHOD

被引：52

作者：

UEDA, Y

ITO, M

机构：

[1] Department of Electrical and Electronic Engineering, Muroran Institute of Technology, Muroran

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1994年 / 33卷 / 10A期

关键词：

CO-CU ALLOY FILM; ELECTRODEPOSITION; SOLID SOLUTION; MAGNETORESISTANCE; ANNEALING;

D O I：

10.1143/JJAP.33.L1403

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Giant magnetoresistance (GMR) in Co-Cu alloys prepared by the electrodeposition method has been investigated. The formation of solid solution in the as-deposited samples has been confirmed by X-ray diffraction. For Co17Cu83 alloy, the values of the MR ratio at room temperature of as-deposited sample and sample annealed at 400-degrees-C for 25 h are 1.3% and 6.3%, respectively. With an increase in the annealing temperature from 400-degrees-C to 500-degrees-C, the annealing time showing the maximum MR ratio is shifted toward shorter time.

引用

页码：L1403 / L1405

页数：3

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