PRESSURE EFFECTS IN PLANAR MAGNETRON SPUTTER DEPOSITION

被引：34

作者：

HELMER, JC ^{[1
]}

WICKERSHAM, CE ^{[1
]}

机构：

[1] VARIAN ASSOCIATES,DIV SPECIALTY MET,GROVE CITY,OH 43123

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573892

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：408 / 412

页数：5

共 8 条

[1] CATHODE SPUTTERING IN GLOW DISCHARGES [J].

ECKER, G ;

EMELEUS, KG .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1954, 67 (415) :546-552

[2] A SPUTTERING WIND [J].

HOFFMAN, DW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :561-566

LAEGREID, N ;

WEHNER, GK .

[4]

Maissel L.I., 1970, HDB THIN FILM TECHNO, P13

[5]

MINTZ DM, COMMUNICATION

[6]

THORNTON JA, 1982, DEPOSITION TECHNOLOG, P202

[7] Theory of cathode sputtering in low voltage gaseous discharges [J].

Townes, CH .

PHYSICAL REVIEW, 1944, 65 (11/12) :319-327

[8]

WAITS RK, 1978, THIN FILM PROCESS, P143