共 9 条
- [1] Sakaki H., Wagatsuma K., Hamasaki J., Saito S., Thin Solid Films, 36, (1976)
- [2] Sakaki H., Jpn. J. Appl. Phys, 19, (1980)
- [3] Arakawa Y., Sakaki H., Appl. Phys. Lett., 40, (1982)
- [4] Chang Y.C., Chang L.L., Esaki L., Appl. Phys. Lett., 47, (1985)
- [5] Pfeiffer L.N., West K., Stormer H.L., Eisenstein J.P., Baldwin K.W., Gershoni D., Spector J., Appl. Phys. Lett., 56, (1990)
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- [8] fact, the region designated as the 50 nm thick AlAs layer (see Fig. 1) is a 5 period superlattice consisting of 10 nm thick AlAs and 1 nm thick GaAs. This superlattice structure is quite effective to decrease the interface roughness of the multi-QW layer in the first growth
- [9] Someya T., Akiyama H., Sakaki H., Phys. Rev. Lett., 74, (1995)