CHARACTERIZATION OF AMORPHOUS TUNGSTEN TRIOXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING METHOD

被引：33

作者：

NANBA, T ^{[1
]}

TAKAHASHI, T ^{[1
]}

TAKADA, J ^{[1
]}

OSAKA, A ^{[1
]}

MIURA, Y ^{[1
]}

YASUI, I ^{[1
]}

KISHIMOTO, A ^{[1
]}

KUDO, T ^{[1
]}

机构：

[1] UNIV TOKYO,INST IND SCI,MINATO KU,TOKYO 106,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1994年 / 178卷

关键词：

D O I：

10.1016/0022-3093(94)90290-9

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Amorphous tungsten trioxide thin films were prepared using a rf magnetron sputtering method. The relation between structure and electrochromic properties was investigated, At the macroscopic level, the films had dense structures. From Raman spectroscopic and X-ray radial distribution analyses, it was deduced that the networks were basically formed by three-, four- and six-membered rings of corner-sharing WO6 octahedra, and in the films with low O/W atomic ratios many edge-sharing units were present. It was also found that the films with high O/W ratios showed good electrochromic properties, which were closely related to the six-membered rings,

引用

页码：233 / 237

页数：5

共 9 条

[1] INFRARED AND RAMAN-STUDY OF WO3 TUNGSTEN TRIOXIDES AND WO3, XH2O TUNGSTEN TRIOXIDE HYDRATES [J].