IMAGING MICROANALYSIS OF SURFACES WITH A FOCUSED GALLIUM PROBE

被引：24

作者：

CHABALA, JM ^{[1
]}

LEVISETTI, R ^{[1
]}

WANG, YL ^{[1
]}

机构：

[1] UNIV CHICAGO,DEPT PHYS,CHICAGO,IL 60637

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.584321

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：910 / 914

页数：5

共 19 条

[1] INSITU HIGH-VOLTAGE TEM OBSERVATION OF AN ELECTROHYDRODYNAMIC (EHD) ION-SOURCE [J].

BENASSAYAG, G ;

SUDRAUD, P ;

JOUFFREY, B .

ULTRAMICROSCOPY, 1985, 16 (01) :1-8

[2]

BENNINGHOVEN A, 1973, PHYS LETT A, V40, P260

[3] COMPUTER-SIMULATIONS OF SPUTTERING [J].

BIERSACK, JP .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 27 (01) :21-36

[4]

BOZACK MJ, 1985, SCANNING ELECTRON MI, V4, P1339

[5]

Butler, 1966, 6TH P INT C EL MICR, V1, P191

[6]

CHABALA J, IN PRESS APPL SURF S

[7] ACCEPTANCE OF QUADRUPOLE MASS FILTER [J].

DAWSON, PH .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1975, 17 (04) :423-445

[8]

FOX TR, 1981, 28TH P INT FIELD EM, P92

[9] HIGH SPATIAL-RESOLUTION SIMS WITH THE UC-HRL SCANNING ION MICROPROBE [J].

LEVISETTI, R ;

WANG, YL ;

CROW, G .

JOURNAL DE PHYSIQUE, 1984, 45 (NC9) :197-205

[10]

LEVISETTI R, 1986, SECONDARY ION MASS S, V5, P132

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