Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures

被引:55
作者
Anderson, EH
Boegli, V
Muray, LP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期
关键词
D O I
10.1116/1.588387
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A vector scan pattern generator, optimized for smooth curvilinear as well as rectilinear primitive shapes, has been designed and constructed. The pattern generator uses high-speed hardware to implement a set of second-order, quadratic equations to drive digital to analog converters and high-speed array processors to calculate the coefficients for these equations. The digital pattern generator package contains the high-speed digital, analog, and high-resolution analog electronics. The initial lithography results confirm the operation of the system and stepping rates of 40 MHz have been achieved. (C) 1995 American Vacuum Society.
引用
收藏
页码:2529 / 2534
页数:6
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