PLASMA ACTIVATED PHYSICAL VAPOR-DEPOSITION (PAPVD) BY HOLLOW-CATHODE ARC (HCA)

The HCA is a good adaptable plasma source for the performance of plasma activated deposition. Experimental investigations of the HCA plasma show that the plasma consists of four components: isotropical distributed ions, electrons and neutrals as well as non-isotropical distributed electrons-beam-like electrons. The plasma conditions near the substrate are characterized by the isotropic part of the plasma. The beam electrons and the anode-fall are used for the evaporation of materials in a water-cooled crucible. The physical principle of HCA evaporating device, the energy balance, and technological aspects of its application will be discussed in detail.