AGING OF FE-AL THIN-FILM MULTILAYERS IN AN OXIDIZING ENVIRONMENT IN THE 300-400-K RANGE

被引：4

作者：

CARBUCICCHIO, M

PALOMBARINI, G

BERTONCELLO, R

GLISENTI, A

TONDELLO, E

SBERVEGLIERI, G

机构：

[1] UNIV BOLOGNA,INST MET,I-40126 BOLOGNA,ITALY

[2] UNIV PADUA,DEPT INORGAN MET ORGAN & ANALYT CHEM,I-35100 PADUA,ITALY

[3] UNIV BRESCIA,DEPT IND AUTOMAT,BRESCIA,ITALY

来源：

HYPERFINE INTERACTIONS | 1994年 / 92卷 / 1-4期

关键词：

D O I：

10.1007/BF02065763

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

Multilayers constituted by very thin films of Fe and Al were deposited by thermal evaporation and aged in air at temperatures in the 300-400 K range for times up to 200 h. Interdiffusion phenomena occurred during the deposition process. The oxidizing treatments enhanced interdiffusion phenomena and modified the multilayer structure.

引用

页码：1249 / 1255

页数：7

共 4 条

[1] STUDY OF FE-AL THIN-FILMS OXIDIZED AT ROOM-TEMPERATURE [J].