ANALYSIS OF THE STRAIN PROFILE IN THIN AU/NI MULTILAYERS BY X-RAY-DIFFRACTION

被引：18

作者：

CHAUDHURI, J ^{[1
]}

GONDHALEKAR, V ^{[1
]}

JANKOWSKI, AF ^{[1
]}

机构：

[1] UNIV CALIF LAWRENCE LIVERMORE NATL LAB,LIVERMORE,CA 94550

来源：

JOURNAL OF APPLIED PHYSICS | 1992年 / 71卷 / 08期

关键词：

D O I：

10.1063/1.350896

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The strain relaxation in Au/Ni multilayers was analyzed in detail using a dynamical theory of x-ray diffraction. The depth profile of strain in the modulation direction was determined by an iterative fitting of the calculated rocking curve with the experimental one. The repeat periods of Au/Ni multilayers used in this study range from 0.82 to 9.0 nm. The analysis indicates that the theoretical x-ray patterns are extremely sensitive to the amount of strain at the interface.

引用

页码：3816 / 3820

页数：5

共 24 条

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