PHOTOTHERMAL CHARACTERIZATION OF OPTICAL THIN-FILMS

被引：30

作者：

WU, ZL ^{[1
]}

KUO, PK ^{[1
]}

WEI, LH ^{[1
]}

GU, SL ^{[1
]}

THOMAS, RL ^{[1
]}

机构：

[1] WAYNE STATE UNIV,INST MFG RES,DETROIT,MI 48201

来源：

THIN SOLID FILMS | 1993年 / 236卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(93)90668-F

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper presents the salient features of the mirage technique for thermal characterization of thin films. Experimental results are given for thin films with various thicknesses and of various materials, including tens-of-nanometer metallic films and submicron dielectric optical coatings. While the emphasis is on the experimental technique, the heat conduction mechanisms in these thin films are also discussed.

引用

页码：191 / 198

页数：8

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